Document Type : Research

Authors

• noushin dadashzadeh ¹
• Elnaz Pourreza ²

¹ Assistant Professor, Department of Electrical Engineering Aras Branch, Islamic Azad University, Jolfa, Iran

² Faculty of Electrical engineering, Sahand University of Technology, Tabriz, Iran

Abstract

Inductively coupled plasma (ICP) is widely used in applications such as material processing and In this comparative study, we aim to design a dielectric barrier discharge (DBD) reactor under atmospheric pressure. The current requirement is to characterize the plasma and optimize the designed plasma system under variable circumstances. A one-dimensional time-dependent simulation of a DBD tool, driven by a sinusoidal RF voltage with an amplitude of 755 kV at 52 kHz, in argon gas is shown. The DBD device with two electrodes, covered by dielectric material and with variable dielectric constant between 2, 5 and 8 was considered, and the discharge parameters were simulated in terms of time across the plasma space to find an optimal dielectric constant for delivering maximum power deposition. Using a sinusoidal voltage to DBD device with different dielectric constant, electric field profiles, electron density, electron temperature, mass fraction of argon atoms, average electron energy, ion current density, electron current density, plasma, and power deposition are shown.

Keywords

• Dielectric barrier discharge reactor
• electron density
• simulation
• plasma
• dielectric constant